PIKE IRIS ATR

傳統的Diamond ATR跟Ge 晶體最大的限制在於掃描範圍太過狹窄,無法涵蓋一般4000-400cm-1的範圍

PIKE利用新的技術經過改良,正式發表新的IRIS ATR裝置

Diamond ATR 範圍 : 4000 - 400 cm-1 ( 4000 - 30 cm-1)

Ge ATR 範圍 : 4000 - 450 cm-1

Max Pressure : 10,000 psi

適用於任何廠牌的FTIR儀器

各種不同的晶體其適用的掃描範圍及耐酸鹼強度特性：

了解更多

PIKE MIRacle ATR up to 120°C
​單點/多點反射裝置

• 45 度入射角，1.8 mm 單點/6.0 mm 多點反射
• 高感度，約 25 %光輸出量
• 適用於固體，液體，橡膠，粉末樣品
• 可加熱至120 ° C
• 提供ZnSe,Ge,AMTIR,Dimand等不同晶體選擇

PIKE GladiATR illuminate
UV 光化學反應裝置,up to 210°C

• Diamond Crystal,45 度入射角
• 340-800 nm,420-2000 nm 兩種可選擇
• 傳統的光化學裝置UV 燈自上而下照射樣品，而紅外測量則是自下而上進行掃描，由於樣品厚度不均勻，這種差異導致整個樣品不同深度的光強度存在差異，影響了準確性
  GladiATR Illuminate 為了克服挑戰，將UV 光從下方照射樣品，將樣品的吸收截面與紅外光束的位置對齊以進行檢測。​

PIKE VeeMax III Variable 
可變角度反射裝置

• 30 to 80 ° 可變入射角
• 可深至 0.4 to 46 micron 樣品
• 適用於測試不同深度樣品檢測
• 樣品大小： 20 mm diameter
• 可加購電腦控制軟體

​PIKE ReactorMAX ATR up to 215°C
​
​多點可變角度反射反應裝置

​

• 45 / 60 度入射角，AMTIR 晶體  56*10*4 mm
• 4000 - 800 cm-1
• 可變角度 35-65 度
• 可加熱至215 ° C ,可耐壓 55 Bar
• 反射次數 3-9, 0.5-10 micro depth of penetration

​

​PIKE GradiATR up to 300°C
​
​單點加熱反射裝置

​

• 45 度入射角，Diamond/Ge 晶體, 3.0 mm 單點反射
• 4000 - 30 cm-1 ( Diamond) / 4000 - 450 cm-1 (Ge)
• Max Pressure : 30,000 PSI
• 可加熱至300 ° C(Diamond) / 130 ° C (Ge)

​

​PIKE VeeMax III JackFish 
​
​電化學可變角度單點反射裝置

• 45 度入射角，Ge晶體
• 可變角度 35-80 度
• 20 ml Cell Solution Volume
• Teflon / Glass Cell 
• For Electronic Chemistry  Analysis

Harrick VariGATR
​單點可變高角度反射裝置

• 60º to 65º 可變入射角
• 可檢測至8"吋樣品
• 使用Ge hemispherical 晶體
• 檢測Si and 金屬表面薄膜樣品

Harrick ConcentralIR2
​多點反射裝置,up to 200°C

• 專測小至10 µl 液體樣品
• ​Si (30°)晶體 : 11 次反射
• Extended Si (30°)晶體 : 23 次反射
• Diamond (45°)晶體 : 10 次反射

Harrick FasIR Analysis System
單點反射裝置,up to 175°C

• 45° ZnSe,for liquids, pastes, gels 
• AOAC method 2000.10,Real-time in situ monitoring of the trans fat formation during processing of edible oils​​​​

Harrick AccessATR
​單點反射裝置

• Fixed 45° incident angle single reflectance
• Spectral range: 20,000 cm-1 to 550 cm-1
• Readily replaceable ZnSe ATR crystal.
• No alignment required
• For Most FTIR instrument

Harrick DiaMax ATR
​單點鑽石晶體可加熱反射裝置

• Sampling area: 1.5mm in diameter​​
• high sample throughput
• Built-in pressure applicator with slip-clutch
• No sample preparation required.​
• Optional solid sampling adapter   up to 200°C

Harrick WafIR Wafer Check
多點33次反射裝置

• Wafer Check ATR
• Wafer : up to 203 mm (8") in diameter 
• Fixed 45° incident angle,Si crystal
• 33 reflections from the coated surface for a 0.770 mm thick ​wafer

Golden Gate High Temperature Diamond ATR
up to 300  or -150 to 80 °C

PIKE EasiDiff

• 已由原廠校正好,只要放入FT-IR內即可使用，不須使用者再作調整
• Sample 不須打片,便可直接偵測
• 快速分析,可取代傳統油壓機打片的方法

PIKE UpIR 

• Out-of-compartment design,與EasiDiff 的功能相同
• 方便分析大型的樣品​,可直接將樣品放在平台上即可檢測

PIKE DiffusIR up to 1000°C

• 高溫/低溫觸媒反應裝置
• 可選擇不同的加熱室,溫度可包括  -150 up to 1000°C at 1500 psi pressure) 的範圍

Harrick Praying Mantis Diffuse Reflectance up to 910 °C
​for FTIR,UV-VIS-Near IR         高溫/低溫觸媒反應裝置

DRP-XXX Praying Mantis Kit

HVC-DRP High Temperature Reaction cell

高溫/低溫觸媒反應裝置 :
Praying Mantis Diffuse Reflectance Accessory
Highly efficient collection system.
Minimal collection of the specular component.
Easy access to the sampling area.
Straightforward attachment of reaction chambers.
Includes PermaPurge for rapid exchange with minimal interruption of the purge.
High Temperature, Low Pressure Reaction Chamber

• Designed for operation from high vacuum (133 Pa or 10-6 torr) to 133 kPa (1 ktorr) with KBr windows or 1.5 MPa (11.2 ktorr) with ZnSe or SiO2 windows.
• Achieves temperatures up to 910 degree C (under vacuum).
• Readily adapted with a High Pressure Dome for operation up to 3.44MPa (25.8 ktorr).
• Three inlet/outlet ports provided for evacuating the cell and introducing gases.
• Made from chemically resistant 316 stainless steel.
• Optional cooling cartridge for moderate cooling or heating with a recirculator temperature Controller
  Accurate temperature regulation from -200 to 1250 degree C for K-type thermocouples
  
  

TempLink Software for Thermo OMNIC and Bruker Opus Software

與Thermo 及Bruker 儀器控制軟體連動,直接設定各項升溫參數並掃描收集FTIR光譜圖

Harrick Refractor2 Grazing Angle

• 金屬表面薄膜分析
• 75º incident angle
• Build in Si Polarizer
• ​For most FTIR Instrument
  

Harrick Refractor up to 500°C

• Heatable to 500 ° C,10 -4 to 2 Atm Pressure​
• Fixed 75° incident angle for high sensitivity to contaminants and thin films on metals.
• Operable at pressures from 13 mPa (10-4 torr) to 203 kPa (2 ATM).
• Application : Kinetic Analysis of Thin Film on Metal

 Harrick/PIKE Polarizer

• Polarizer with specular or HATR accessory to increase sensitivity in FTIR
• Material:KRS-5,ZnSe etc
• ​For Most FTIR Spectrometer