PIKE IRIS ATR
各種不同的晶體其適用的掃描範圍及耐酸鹼強度特性:
PIKE MIRacle ATR up to 120°C
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PIKE GladiATR illuminate
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PIKE VeeMax III Variable
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PIKE ReactorMAX ATR up to 215°C 多點可變角度反射反應裝置
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PIKE GradiATR up to 300°C 單點加熱反射裝置
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PIKE VeeMax III JackFish 電化學可變角度單點反射裝置
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Harrick VariGATR
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Harrick ConcentralIR2
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Harrick FasIR Analysis System
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Harrick AccessATR
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Harrick DiaMax ATR
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Harrick WafIR Wafer Check
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高溫/低溫觸媒反應裝置 :
Praying Mantis Diffuse Reflectance Accessory
Highly efficient collection system.
Minimal collection of the specular component.
Easy access to the sampling area.
Straightforward attachment of reaction chambers.
Includes PermaPurge for rapid exchange with minimal interruption of the purge.
High Temperature, Low Pressure Reaction Chamber
Praying Mantis Diffuse Reflectance Accessory
Highly efficient collection system.
Minimal collection of the specular component.
Easy access to the sampling area.
Straightforward attachment of reaction chambers.
Includes PermaPurge for rapid exchange with minimal interruption of the purge.
High Temperature, Low Pressure Reaction Chamber
- Designed for operation from high vacuum (133 Pa or 10-6 torr) to 133 kPa (1 ktorr) with KBr windows or 1.5 MPa (11.2 ktorr) with ZnSe or SiO2 windows.
- Achieves temperatures up to 910 degree C (under vacuum).
- Readily adapted with a High Pressure Dome for operation up to 3.44MPa (25.8 ktorr).
- Three inlet/outlet ports provided for evacuating the cell and introducing gases.
- Made from chemically resistant 316 stainless steel.
- Optional cooling cartridge for moderate cooling or heating with a recirculator temperature Controller
Accurate temperature regulation from -200 to 1250 degree C for K-type thermocouples
TempLink Software for Thermo OMNIC and Bruker Opus Software
與Thermo 及Bruker 儀器控制軟體連動,直接設定各項升溫參數並掃描收集FTIR光譜圖
Harrick Refractor2 Grazing Angle
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Harrick Refractor up to 500°C
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Harrick/PIKE Polarizer
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